JPH0334577B2 - - Google Patents

Info

Publication number
JPH0334577B2
JPH0334577B2 JP58026156A JP2615683A JPH0334577B2 JP H0334577 B2 JPH0334577 B2 JP H0334577B2 JP 58026156 A JP58026156 A JP 58026156A JP 2615683 A JP2615683 A JP 2615683A JP H0334577 B2 JPH0334577 B2 JP H0334577B2
Authority
JP
Japan
Prior art keywords
substrate
optical axis
optical system
pellicle
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58026156A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59152626A (ja
Inventor
Masataka Shiba
Mitsuyoshi Koizumi
Yukio Uto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58026156A priority Critical patent/JPS59152626A/ja
Priority to US06/548,516 priority patent/US4669875A/en
Publication of JPS59152626A publication Critical patent/JPS59152626A/ja
Priority to US07/360,971 priority patent/USRE33991E/en
Publication of JPH0334577B2 publication Critical patent/JPH0334577B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume or surface-area of porous materials
    • G01N15/02—Investigating particle size or size distribution
    • G01N15/0205—Investigating particle size or size distribution by optical means
    • G01N2015/0238—Single particle scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N2021/4792—Polarisation of scatter light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/10—Scanning
    • G01N2201/105—Purely optical scan
    • G01N2201/1053—System of scan mirrors for composite motion of beam

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP58026156A 1982-11-04 1983-02-21 異物検出装置 Granted JPS59152626A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP58026156A JPS59152626A (ja) 1983-02-21 1983-02-21 異物検出装置
US06/548,516 US4669875A (en) 1982-11-04 1983-11-03 Foreign particle detecting method and apparatus
US07/360,971 USRE33991E (en) 1982-11-04 1989-06-02 Foreign particle detecting method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58026156A JPS59152626A (ja) 1983-02-21 1983-02-21 異物検出装置

Publications (2)

Publication Number Publication Date
JPS59152626A JPS59152626A (ja) 1984-08-31
JPH0334577B2 true JPH0334577B2 (en]) 1991-05-23

Family

ID=12185676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58026156A Granted JPS59152626A (ja) 1982-11-04 1983-02-21 異物検出装置

Country Status (1)

Country Link
JP (1) JPS59152626A (en])

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2577920B2 (ja) * 1987-07-24 1997-02-05 株式会社 堀場製作所 異物有無検査装置
JPH0621879B2 (ja) * 1987-11-14 1994-03-23 株式会社堀場製作所 異物有無検査装置
JPH02194352A (ja) * 1989-01-24 1990-07-31 Fuji Electric Co Ltd 透明基板表面検査装置
US7158208B2 (en) * 2004-06-30 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1580196A (en) * 1976-05-27 1980-11-26 Ferranti Ltd Gloss measuring surface inspection systems
JPS5671173A (en) * 1979-11-14 1981-06-13 Hitachi Ltd Pattern detection method of printed circuit substrate
JPS5780546A (en) * 1980-11-07 1982-05-20 Nippon Kogaku Kk <Nikon> Detecting device for foreign substance

Also Published As

Publication number Publication date
JPS59152626A (ja) 1984-08-31

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